Quorum Technologies

INTRODUCTION TO QUORUM TECHNOLOGIES

Quorum Technologies own the Polaron brand, and in early 2006 they also purchased Emitech. ProSciTech is the sole distributor for these three brands in Australasia, south of Singapore. Some additional data may be available from www.quorumtech.com.

Warranty: Quorum Technologies offer a standard 12 months warranty on all instruments. This can be extended to 3 years by filling in and returning the registration form. Pumps are excluded from the extension.

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TURBO VERSUS OIL DIFFUSION PUMPED COATERS

Turbo pumps are very expensive and the price increases with size. The Quorumtech designs are focused on practical applications using the most compact designs; smaller chambers require smaller TM pumps.

There is a cheaper alternative: oil diffusion pumps. Evaporators equipped with these are considerably cheaper to purchase, but do not even consider these. Diffusion pumps use much more electricity and require a cooling water circuit with about 5 litres/min going down a drain - illegal to use in many municipalities. Alternatively, a closed cooling circuit with pumps and chillers may be used, but that requires more maintenance and electricity. Diffusion pumps use expensive vacuum fluids, and cleaning the pump is not a fun job. TM pumps require almost no maintenance and run for well over a decade, usually with almost no attention.

For many applications, any oil in the vacuum chamber is unacceptable. TM pumps do not allow any oil vapour from the backing pump to pass through and into the chamber. Diffusion pumps do not have that facility, and small amounts of oil vapour will migrate into the chamber.

CARBON EVAPORATION

The use of carbon films on TEM specimen grids or as carbon coatings is common in electron microscopy. These films add little to the background signal and they have relatively good electrical conductivity. Thin films (5 nanometres) are used in TEM to stabilise some specimens. Thicker films (up to 30 nanometres) may be used for TEM support films and in SEM for X-Ray microanalysis. Commonly, a high vacuum evaporator with carbon rods is used to produce these coatings and this system is preferred for some applications. The use of carbon fibre, has allowed a flash evaporation technique, which is suitable for many general EM requirements. Quorum manufactures a range of evaporators to meet all needs. Carbon coatings produced in high vacuum have a finer grain and these are preferred for some TEM applications; flash evaporated carbon is used for conventional SEM and EDS /WDS. Carbon fibre must be used in the low vacuum, rotary vane pump only. For high vacuum system carbon/graphite rods are preferable.

PUMPS: All carbon evaporators require an appropriate size, two stage mechanical pump. Turbo pumped instruments include the turbo pump, but require a mechanical pump to back the turbo pump. ProSciTech supplies pumps for these instruments or as separate pumps for other equipment quite competitively. Inquire for more information.

KQ150T
KQ150T
Argon plasmas are redish; nitrogen plasmas are blue, nitrogen is a poor sputtering agent
Argon plasmas are redish; nitrogen plasmas are blue, nitrogen is a poor sputtering agent
Colour touch screen control
Colour touch screen control
Easy to change coating inserts
Easy to change coating inserts
TURBO PUMPED, HIGH RESOLUTION SPUTTER COATER/ CARBON EVAPORATOR

KQ150T is a compact turbomolecular-pumped coating system suitable for SEM, TEM and many thin film applications.

All Q150 models have a colour touch screen interface.

KQ150T is available in three versions:
KQ150T-S - high resolution sputter coater, suitable for oxidising and non-oxidising metals
KQ150T-E - high vacuum carbon coater for SEM and TEM applications
KQ150T-ES - high resolution sputter and high vacuum carbon coater


Some accessories are shown low on page K1


Features

  • Metal sputtering or carbon evaporation, or both - can be combined in one space-saving design
  • Fine grain sputtering for advanced high resolution FE-SEM applications
  • High vacuum turbo pumping - allows sputtering of a wide range of oxidising and non-oxidising metals - suitable for SEM, high resolution FE-SEM and also for many thin film applications
  • Chamber size 152 (internal) x 127mm high (214mm high option available)
  • High vacuum carbon coating - ideal for SEM and TEM carbon coating applications
  • Advanced 'anti-stick' carbon rod evaporation gun - simple operation, reproducible results
  • Control of evaporation current profile - ensures consistently reproducible carbon films
  • Precise thickness control using the film thickness monitor option
  • Fully automatic touch screen control - rapid data input, simple operation
  • Multiple, customer-defined coating schedules can be stored - ideal for multi-user laboratories
  • Automatic vacuum control which can be pre-programmed to suit the process and material - no needle valve to adjust
  • 'Intelligent' recognition of system - automatically detects the type of coating insert fitted
  • Easy-to-change, drop-in style specimen stages (rotation stage as standard)
  • Vacuum shut-down feature - leaves the process chamber under vacuum when not in use - improved vacuum performance
  • Thick film capabilities - up to 60 minutes sputtering time without breaking vacuum (rest periods automatically built in)
  • Glow discharge option for S and ES (ask for price) - for modification of sample surface properties (eg hydrophobic to hydrophilic conversion) or for cleaning / removal of contaminating surface residues
  • Ergonomic one-piece moulded case - easy maintenance and service access
  • Ethernet with local FTP server connection - simple programmer updates
  • Power factor correction - complies with the current legislation (CE Certification) - efficient use of power means reduced running costs
  • Three-year warranty

Optional Accessories

  • Required is a backing pump: we recommend a 50L/m two-stage rotary pump with oil mist filter - (order separately, see page V4 and K6)
  • Additional sputter insert
  • Carbon rod insert (3.05mm rods)
  • Glow discharge insert
  • Additional glass cylinder assembly
  • Extended glass cylinder assembly
  • Rotating vacuum spigot
  • Film thickness monitor
  • FTM crystal
  • Tilt stage assembly
  • Slide stage
  • Rotacota stage
  • 4" wafer stage and gearbox
  • L gasket


More information & technical specifications
Product video of Q series of sputter/carbon coaters


Note that the glow discharge option is only available for KQ150T-S and KQ150T-ES

KQ150T-E
Carbon evaporator, high vacuum, turbo pumped
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KQ150T-ES
Combination sputter coater & carbon evaporator, turbo pumped
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KQ150T-G
Glow discharge insert, for KQ150T
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KQ150T-S
Sputter coater, high resolution, turbo pumped
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KQ300T-D
KQ300T-D
KQ3000 Dual sputtering head for sequential coatings
KQ3000 Dual sputtering head for sequential coatings
TURBO-PUMPED SPUTTER COATERS, DUAL TARGET

The KQ300T-D is a fully automatic, free-standing sputter coater ideally suited for thin film applications and for conductive coating of scanning electron microscopy (SEM) specimens.

At the operational heart of the KQ300T-D is a large chamber fitted with two independent sputtering heads. This dual-head configuration allows two different metals to be sequentially sputtered without the need to 'break' vacuum. A dual channel film thickness monitor option is available.

The system is designed to sputter a wide range of oxidising metals, eg chromium (Cr) and aluminium (Al), and non-oxidising (noble) metals, eg gold (Au) and platinum (Pt).

The KQ300T-D sputter coater has a 300mm x 127mm work chamber and a specimen stage that accepts substrates of 2-4" wafer sizes as standard and 6" wafers with an optional stage accessory. An optional extended height glass chamber is available to enable coating of larger specimens.

KQ300 is available in three formats:

  • KQ300R-T - Sputter coater, large chamber, rotary-pumped, triple target
  • KQ300T-D - Sputter coater, large chamber, turbo-pumped, dual target
  • KQ300T-T - Sputter coater, large chamber, turbo-pumped, triple target

Required is a backing pump: we recommend a 50L/m two-stage rotary pump with oil mist filter - (order separately, see page V4 and K6)

More information & technical specifications

Product video of Q series of sputter/carbon coaters

KQ300T-D
Sputter coater, large chamber, turbo-pumped, dual target
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Vacuum chamber assembly for glove box
Vacuum chamber assembly for glove box
Vacuum chamber assembly for glove box
KQ150 Main unit for glove box sputter coater
KQ150 Main unit for glove box sputter coater
COMBINED SPUTTER COATER/EVAPORATOR FOR MOUNTING IN A GLOVE BOX

The KQ150GB is a modular glove box version of the highly successful KQ150T-ES bench top turbomolecular-pumped coating system - suitable for SEM, TEM and many thin-film applications. The KQ150GB comes as standard with sputtering and carbon rod evaporation inserts and a rotating specimen stage. Options include a metal evaporation insert, glow discharge, a film thickness monitor (FTM), aperture cleaning insert and special stages to suit a range of specimen types.

Key features

  • Modular construction for mounting in glove boxes
  • Integral glove box pressure monitoring
  • Remote operation from a touch screen control panel
  • Metal sputtering and carbon evaporation in one system
  • Fine grain sputtering - for advanced high resolution FE-SEM applications
  • High vacuum turbo pumping - allows sputtering of a wide range oxidising and non-oxidising metals
  • High vacuum carbon rod coating - ideal for SEM and TEM carbon coating applications (carbon fibre available as an option)
  • Advanced "anti-stick" carbon rod evaporation gun - simple operation, reproducible results
  • Control of evaporation current profile - ensures consistently reproducible carbon films
  • Precise thickness control using the film thickness monitor option
  • Fully automatic touch screen control - rapid data input, simple operation
  • Multiple, customer defined coating schedules can be stored - ideal for multi-user laboratories
  • Automatic vacuum control which can be pre-programmed to suit the process and material - no manual needle valve to adjust
  • "Intelligent" recognition of system - automatically detects the type of coating insert fitted
  • Easy-to-change, drop-in style specimen stages (flat rotation stage as standard)
  • Vacuum shut down feature - leaves the process chamber under vacuum when not in use - improved vacuum performance
  • Thick film capabilities - up to 60 minutes sputtering time without breaking vacuum
  • Power Factor Correction - complies with the current legislation (CE certification) - efficient use of power means reduced running costs
  • Three-year warranty


More information & technical specifications

KQ10837
Glow discharge attachment
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KQ150GB
Sputter coater & carbon evaporator, turbo pumped, for use in a glove box
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KQ300T-T large chamber, turbo pumped, triple target
KQ300T-T large chamber, turbo pumped, triple target
Open chamber showing triple targets
Open chamber showing triple targets
Standard specimen stage with 4
Standard specimen stage with 4" wafer. Optional FTM fitted
TURBO-PUMPED SPUTTER COATER, TRIPLE TARGET

The KQ300T-T is a large chamber, turbomolecular-pumped coating system ideally suited for sputtering a single large diameter specimen up to 8"/200mm (eg a wafer) or multiple smaller specimens over a similar diameter.

The KQ300T-T is fitted with three individual sputtering heads to ensure even deposition on a range of specimen types. The system is designed to sputter both oxidising metals, eg chromium (Cr) and aluminium (Al), and non-oxidising (noble) metals, eg gold (Au), gold/palladium (Au/Pd) and platinum (Pt). The KQ300T-T is fitted with three individual sputtering heads to ensure even sputtering deposition over a large diameter. Chromium (Cr) targets are fitted as standard.

NB: For sputtering non-oxidising metals only, see the KQ300R-T Triple Target, Large Chamber, Rotary-Pumped Sputter Coater.

For sequential sputtering of two different oxidising or non-oxidising metals, see the KQ300T-D Dual Target Sequential Sputtering System

KQ300 is available in three versions:

  • KQ300R-T - Sputter coater, large chamber, rotary-pumped, triple target
  • KQ300T-D - Sputter coater, large chamber, turbo-pumped, dual target
  • KQ300T-T - Sputter coater, large chamber, turbo-pumped, triple target


Required is a backing pump: we recommend a 50L/m two-stage rotary pump with oil mist filter - (order separately, see page V4 and K6)

More information & technical specifications

Product video of Q series of sputter/carbon coaters

KQ300T-T
Sputter coater, large chamber, turbo-pumped, triple target
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K975X Turbo evaporator for carbon and metals
K975X Turbo evaporator for carbon and metals
Sputter head
Sputter head
Specimen drawer with stage in specimen exchange position
Specimen drawer with stage in specimen exchange position
Specimen stage and optional FTM
Specimen stage and optional FTM
Carbon evaporation source fitted
Carbon evaporation source fitted
Carbon source is of an anti-stick design which prevents loss of contact during evaporation
Carbon source is of an anti-stick design which prevents loss of contact during evaporation
Metal evaporation source shown with shield
Metal evaporation source shown with shield
Typical chamber set-up, showing carbon and metal evaporation sources, specimen stage and optional FTM
Typical chamber set-up, showing carbon and metal evaporation sources, specimen stage and optional FTM
HIGH VACUUM EVAPORATOR for Multiple Applications

EMITECH K975X

The K975X Turbo Evaporator, is a multiple application system to enable a range of preparation techniques to be applied with the flexibility and module expansion capability to develop new methods and prepare new specimens.

It allows for Carbon Evaporation, Metal Evaporation from both Baskets and Crucibles and a Sputter Coating option.

A range of techniques can be practiced including carbon support films and replicas for TEM, Carbon/Metal Evaporation, Low Angle Shadowing and sequential layer coatings using dual source evaporation and the Sputter Coating option can be used for a range of target materials.

The system flexibility is further enhanced by the use of a microcontroller, which readily allows the Customer access to a range of options, but readily 'defaults' to optimum operating conditions, allowing both fully automatic and manual override as required.

The unique Loading Rack out Drawer sample system gives the user easy sample access with good sample size and the hinged lid assembly makes any other areas of the system readily accessible.

The unit has a Turbo Pump, externally mounted for convenience and easy exchange, and is backed up by a Rotary Vacuum Pump. The complete pumping sequence is under fully automatic control, achieving a high vacuum for evaporation.

The Unit is bench mounted, with easy to use controls, and cannot be damaged by inadvertent use.

Note: The K975s is based on the K975X, however it has a special load lock door which allows the entry of 8" wafer for carbon coating, with applications such as FIB work.

Features:

  • Automatic pumping sequence
  • Samples up to 140mm square or 200mm diameter
  • Unique 'anti-stick' carbon rod gun evaporation assembly
  • Rack out drawer sample loading system
  • Selectable evaporation supplies giving x 4 evaporation settings
  • Restricted or full vent control
  • Sputter coating (option) for range of metal targets, including Cr & Pt
  • Film thickness monitor (option)


Advantages:

  • Ease of operation
  • Flexible usage
  • Reliable carbon evaporation
  • Convenient sample loading/unloading
  • Flexible operation - carbon and metal evaporation sources
  • Prevents disturbance of samples
  • Fully flexible system
  • Easy to measure level of metal or carbon deposition


Specifications of the K975X High Vacuum Evaporator:

  • Instrument Case - W :450mm x D500 x H:300mm
  • Borosilicate Glass Work Chamber with Hinged Top Plate - Dia: 250mm x H: 300mm (can accommodate samples to 200 mm) (8") in Dia.
  • Safety Polycarbonate Implosion Guard - To suit work chamber readily removable for maintenance
  • Weight - 65kg.
  • Carbon Gun - Adjustable height with Tilt Control 0-20o. Uses 6.15mm Carbon Rods
  • Turbomolecular Pump - 100L/Seconds as Standard Optional Sizes Available
  • Vacuum Gauges - Active Gauge Head (incl. Penning gauge) Atm to 1x10-7 mbar.
  • Working Vacuum - within 15 minutes
  • Operating Vacuum - Into x10-5 mbar range (Liquid Nitrogen Trap Option Available)
  • Evaporation Supply (Pulsed or Variable Control) - 4 x Selectable, Low Voltage Volts a.c. V, 5V, 15V,25V @ 25 amps. 7V @100 amps
  • Specimen Table - With Tilt Facility 0-45o
  • Rotating Specimen Table Option - 60mm Dia.Tilting 0-45o, with Variable Speed Control 15rpm To 45rpm
  • Sputtering Option
  • Deposition - 0 - 100mA
  • Deposition Rate - 0-50nm/Minute Gold (Au)
  • Standard Target - 57 mm Au (options Pt, Pt/Pd, Pd, Cr, Ni, Cu, Ag)
  • Timer - 0 to 4 Minutes
  • HT Safety Interlocked


Use of optional sputter module
The sputter module has to be installed by the factory, it is permanently wired into the system. The exchange between sputtering and evaporation is easy - remove the evaporation source or sputter target from the appropriate terminal and replace it with the required source. To avoid contamination of the sputter source with carbon, remove the sputter target from the chamber if only one evaporation is needed. For sequential evaporation and sputtering it is best to install a shutter in order to protect the target during evaporation. (Shutter Assembly - AL410123).

Film Thickness Option

Services- Argon (For Sputtering option) Nominal 4 psi

  • Vacuum Pump (Recommended) - E2M5 complete with vacuum hose and oil mist filter 4m3/h
  • Electrical supply - 230 Volts - 50/60Hz - 8 amp normal including pump. In pulse mode a minimum of 16 amp is required.


Optional Accessories:

  • Rotary pump - See page V4 and K6 + basic oil mist filter
  • EK3170 - Diaphragm pump MD1 23 L/M
  • EK4160 - Low angled shadowing
  • EK4205 - Rotary stage planetary (with externally adjustable tilt)
  • EK4175 - Sputtering module
  • EK4165 - Film thickness monitor (mounted in K975X console)
  • EK3172 - XDS10 Scroll pump
K975X
Turbo evaporator, high vacuum evaporator for multiple applications
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