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Sputter coater, large chamber
A fully automatic, free-standing sputter coater ideally suited for thin film applications and for conductive coating of scanning electron microscopy (SEM) specimens.
At the operational heart of the KQ300T-D is a large chamber fitted with two independent sputtering heads. This dual-head configuration allows two different metals to be sequentially sputtered without the need to 'break' vacuum. A dual channel film thickness monitor option is available.
The system is designed to sputter a wide range of oxidising metals, eg chromium (Cr) and aluminium (Al), and non-oxidising (noble) metals, eg gold (Au) and platinum (Pt).
The KQ300T-D sputter coater has a 300mm x 127mm work chamber and a specimen stage that accepts substrates of 2-4" wafer sizes as standard and 6" wafers with an optional stage accessory. An optional extended height glass chamber is available to enable coating of larger specimens.
KQ300 is available in three formats:
- KQ300R-T - Sputter coater, large chamber, rotary-pumped, triple target
- KQ300T-D - Sputter coater, large chamber, turbo-pumped, dual target
- KQ300T-T - Sputter coater, large chamber, turbo-pumped, triple target
Required is a backing pump: we recommend a 50L/m two-stage rotary pump with oil mist filter - (sold separately)
More information and technical specifications
Product video of Q series of sputter/carbon coaters
